| 品牌 |
产品编号
(生产商编号) |
产品名称 | 等级 | 规格 | 零售价(RMB) | CAS No. |
|
FUJIFILM Wako
------------------ 和光纯药 |
136-16761 |
o-Methoxyphenyl-d7-boronic Acid
|
for Organic Synthesis | 500 mg |
|
- |
|
FUJIFILM Wako
------------------ 和光纯药 |
201-16082 |
Toluene-d8,99.6% 甲苯-d8，99.6% |
for Nuclear Magnetic Resonance | 25 g |
|
2037-26-5 |
|
FUJIFILM Wako
------------------ 和光纯药 |
136-17121 |
Methanol-d4, 100% (min.99.95%) 氘代甲醇-d4，100% （99.95+%） |
for qNMR | 5 g |
|
811-98-3 |
|
FUJIFILM Wako
------------------ 和光纯药 |
096-07321 |
Iron Standard Solution (Fe 1000) 铁标准溶液（Fe 1000） |
for ICP Analysis | 100mL |
|
- |
|
FUJIFILM Wako
------------------ 和光纯药 |
043-17363 |
N,N-Dimethylformamide Diethyl Acetal N,N-二甲基甲酰胺二乙缩醛 |
for Gas Chromatography | 1 ml×10A |
|
1188-33-6 |
|
FUJIFILM Wako
------------------ 和光纯药 |
083-07151 |
0.5mol/l 1-Heptanesulfonic Acid Sodium Salt Solution (Low UV Type) 0.5mol/l 庚烷磺酸钠溶液（低紫外线型） |
for Ion-pair Chromatography | 100 ml |
|
22767-50-6 |
|
FUJIFILM Wako
------------------ 和光纯药 |
077-06271 |
25% Glutaraldehyde Solution 25%戊二醛溶液 |
for Electron Microscopy | 10 ml×10A |
|
111-30-8 |
|
FUJIFILM Wako
------------------ 和光纯药 |
202-19052 |
1,1,2,2-Tetrachloroethane-d2, 99.6% 氘代四氯乙烷 |
for Nuclear Magnetic Resonance | 25 g |
|
33685-54-0 |
|
FUJIFILM Wako
------------------ 和光纯药 |
046-26844 |
Deuterium Oxide, 99.9% 重水，99.9% |
for Nuclear Magnetic Resonance | 1 kg |
|
7789-20-0 |
|
FUJIFILM Wako
------------------ 和光纯药 |
074-06661 |
Gold Standard Solution (Au 1000) 金标准溶液 (Au 1000) |
for ICP Analysis | 100mL |
|
- |
|
FUJIFILM Wako
------------------ 和光纯药 |
028-14251 |
Benzene-d6, 100% 苯-d6,100% |
for Nuclear Magnetic Resonance | 0.8 ml×10 |
|
1076-43-3 |
|
FUJIFILM Wako
------------------ 和光纯药 |
139-16751 |
p-Methoxyphenyl-d7-boronic Acid
|
for Organic Synthesis | 500 mg |
|
- |
|
FUJIFILM Wako
------------------ 和光纯药 |
028-15091 |
Bromate Ion Standard Solution (BrO3- : 2,000ppm) 溴酸根离子标准溶液（BrO3- : 2,000ppm） |
for Ion Chromatography | 50 ml |
|
- |
|
FUJIFILM Wako
------------------ 和光纯药 |
138-09131 |
(R)-(+)-2-Methoxy-2- (trifluoromethyl)phenylacetic Acid （R）-（+）-alpha-甲氧基-alpha-三氟甲基苯乙酸 |
for Nuclear Magnetic Resonance | 1 g |
|
20445-31-2 |
|
FUJIFILM Wako
------------------ 和光纯药 |
033-24491 |
Chloroform, Amylene added 三氯甲烷 |
for GPC | 1 L |
|
67-66-3 |
|
FUJIFILM Wako
------------------ 和光纯药 |
194-07912 |
Sulfix, 850 - 2360um(8 - 20mesh) 氧化银和氧化钴的混合物 |
for Elemental Analysis | 25 g |
|
- |
|
FUJIFILM Wako
------------------ 和光纯药 |
194-09771 |
Sodium Hydroxide, Granular, Blue, 1.70-3.35mm (6 - 10mesh) 氢氧化钠，颗粒，蓝色，1.70-3.35mm （6 - 10目） |
for Elemental Analysis | 50 g |
|
1310-73-2 |
|
FUJIFILM Wako
------------------ 和光纯药 |
193-08406 |
Silicagel 70 F254 Plate-wako 和光硅胶板70 F254 |
for Thin Layer Chromatography | 200 plate(层厚：0.25 mm、规格：5 cm×10 cm) |
|
N/A |
|
FUJIFILM Wako
------------------ 和光纯药 |
016-18271 |
Aluminium Standard Solution (Al 100) 铝标准溶液（Al 100） |
JCSS (Japan Calibration Service System) | 100 ml |
|
- |
|
FUJIFILM Wako
------------------ 和光纯药 |
134-11441 |
Multielement Standard Solution R-II 多元素标准溶液R-II |
for ICP Analysis | 50 ml |
|
- |
